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Oxide ceramics

Material
Sputtertarget
Planar bonded Rotatable
bonded
Chem.
formula
Purity
%
Density
g/cm³
Melting point
°C
Molar mass 
g/mol
Aluminum oxide   Al2O3 99 3,94 2045 101,96
Boron oxide   B2O3 99,9 2,46 450 69,62
Cerium oxide   CeO2 99,9 7,13 2600 172,11
Hafnium oxide   HfO2 99,9 9,68 2774 210,49
Indium tin oxide (ITO)   In2O3/Sn2O3 99,99 7,18 850 **
Magnesium oxide   MgO 99,95 3,58 2852 40,3
Niobium oxide Nb2O3 99,9 4,6 1520 265,8
Scandium oxide   Sc2O3 99,9 3,86 2485 137,9
Silicon oxide   SiO2 99,9 2,08 1710 60,08
Vanadium oxide   V2O5 99,9 3,357 690 181,88
Yttrium oxide   Y2O3 99,9 5,01 2410 225,8
Zinc oxide ZnO 99,99 5,61 1975 81,39
Zinc oxide/Al2O3 (AZO) ZnO/Al2O3 99,99 ** ** **
Zinnoxid   Sn2O3 99,9 6,95 1630 150,71
Zirkonoxid   ZrO2 99,5 5,89 2700 123,22

* sputtering target dimensions according to your wished and drawings.
** Values depend on composition.

The dimensions and the geometric design should be determined together beforehand.