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Non-oxide ceramics

Material
Sputtertarget
Planar bonded Chemical formula Purity
%
Density
g/cm³
Melting point
°C
Molar mass 
g/mol
Boron carbide B4C 99,9 2,52 2350 55,2
Lanthan boride LaB6 99,9 2,61 2210 203,76
Molybdenum silicide MoSi2 99,9 6,31 1920 152,1
Molybdenum sulphide MoS2 99,9 5,06 450 160
Silicon carbide SiC 99,9 3,16 2700 40,1
Silicon nitride Si3N4 99 3,2 1900 140,24
Titanium boride TiB2 99,9 4,38 3225 69,48
Titanium carbide TiC 99,5 4,93 3140 59,88
Titanium nitride TiN 99,5 5,22 2950 81,88
Titanium silicide TiSi2 99,9 4,39 1540 105,04
Tungsten carbide WC 99,9 15,63 2800 195,85
Zircon boride ZrB2 99,5 6,09 3000 112,84

* sputtering target dimensions according to your wished and drawings.

The dimensions and the geometric design should be determined together beforehand.